̽ӑh(hun)ѺͽQĺ_ɷNU̎g(sh)䪚ص(zh)˂Ŀ⡪͜صxӏU̎⾀(xin)UVU̎ԓЪصĹԭ(yu)ݼI(lng)ȫh(hun)oĴ°P(gun)IɫСͺʹҺ(jin)Ҫ@ɷNg(sh)ĺIJ䝓ڵ(hu )B(ti)r(ji)ֵ
1. γԭ
- ͜صxӼg(sh)Low-temperature plasma technologyָ^͜ض£ͨҜأa(chn)ĵxwB(ti)|(zh)̎g(sh)xw|(zh)ĵđB(ti)ɴxؓӺӽMɵČ늚wڵ͜صxӼg(sh)ͨ^(gu)ضOͷʹwھֲ^_xB(ti)ɴӺɻ@Щ^(gun)С̕Њ^к|(zh)]l(f)ЙC(VOCs)Ⱦͬڂyğȼ^(gu)͜صxw^͜ض¹ĶʡԴ\I(yng)ɱЧܺܵc(din)ʹ@헼g(sh)mڹI(y)U̎I(lng)
- UV⣺⾀(xin)UVĹӸ(li)ֽ⻯W(xu)|(zh)|(zh)UVӕr(sh)ӻԭӃȵĻW(xu)Iܕ(hu )Ķl(f)W(xu)ֽ
2. I(lng)
- ͜صxӼg(sh)VڴȾƣNOxVOCs̎ϱԣճӡˢͿӵܣtW(xu)ѪҺxwgͳeI(lng)
- UV⣺ˮͿ՚ăȥЙCȾtԺʳƷI(y)еıTiO2µĿ՚I(lng)
3. C
- ͜صxӼg(sh)漰sW(xu)^(gu)xl(f)W(xu)ͺϵڴڶNڛ](mi)дrֱcȾɟo(w)ͶԵ|(zh)
- UV⣺ͨҪϹʹTiO2UVȾ(hu )ֽCO2H2Oȟo(w)|(zh)ΪʹUVr(sh)Чʿ^HijЩض(li)͵ȾЧ
4. ضȺ͉Ҫ
- ͜صxӼg(sh)ͨҜװٔz϶ȵĜضȷγڳ^͉l¹
- UV⣺һڳسM(jn)o(w)~ĜضȻl
5. Դģ
- ͜صxӼg(sh)a(chn)^(gu)ͨҪ^ߵݔԾS늈(chng)
- UV⣺ҪԴṩ늹Դ̫(yng)ʹ˹Դr(sh)ͬҪ]
֮͜صxӼg(sh)UVǃɷNͬļg(sh)ֶc(din)̓(yu)xwÕr(sh)(sh)HrCϿ]o(w)ՓxķNg(sh)Įa(chn)ƷP(gun)Iڸ(sh)Hh(hun)mx˽@Щ߿ƼIJ҂ܸõؑճɫɫĿ՚|(zh)(wn)}Լͼ˴һ(g)靍ĺgÿһκɞⲢxmԼĿ՚_(ki)ʼ?